Research equipment

Institute for Compound Semiconductors

The Institute for Compound Semiconductors (ICS) is an innovative concept working at the interface of academia and industry, providing world-class fabrication and testing facilities for users to develop and test their research, and to prepare it for exploitation by industry.

Equipment

Name	Make/Model	Details
Evaporator 4	Lesker, Pro Line PVD200	Thin film deposition system - thermal or e-beam metals -Al, Au, Ag, Cr, Zn, Ti, Ni. Sputter- Al, ITO and NiCr.
Evaporator 5	Lesker, Pro Line PVD200	Thin film deposition system with UHV Egun system - thermal or e-beam metals- Al, Au, Ti, Pt, Ni, AuGe
Evaporator 6	BUHLER, Boxer, dielectric evaporator.	With ebeam gun - thermal or e-beam metals- Al, Au, Ti, SiO2. Sputter- SiO2 and SiN.
ICP-RIE Etch tool	Oxford Instruments, PlasmPro 100 Cobra 300.	Plasma etch tool - III-V, GaN, SiN etching.
Rapid Thermal Annealer	JIPELEC, Jetfirst 300 RTP Processor 3 x 400V.	Annealing of metal-semiconductor contacts over 300mm with a controlled N2 or O2 atmosphere. Thermocouple or pyrometer temperature control upto 1200 °C.
6" mask aligner	SÜSS MicroTec, MA6 Mask Aligner.	Photolithographic tool with a 1000W Hg UV lamp. Soft, hard, vacuum and soft-vacuum contact modes.
Wet Oxidation Furnace	AET, ALOX furnace.	With 6" chamber and susceptor.
High Resolution SEM	Hitachi, Regulus8230	High resolution SEM imaging, with EDX X-Flash and FlatQuad detectors.
Axio Imager	Zeiss, Z2 Vario.	High quality microscope for imaging and measurement of critical dimensions over 200mm. Semi-auto mapping available.
Atomic Layer Deposition (ALD)	Beneq, ALD, Thin Film System TFS200.	From summer 2019: ALD deposition of TiO2, TiN, Ta2O5, Al2O3, ZnO, SiO2, SiN, NiO, ITO, MoO.
X-Ray Diffractometer (XRD)	X'Pert3 MRD XL.	To characterise thin film based optoelectronic devices.

Institute for Compound Semiconductors

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