Atomic Layer Deposition (ALD)

Make/model	Beneq, ALD, Thin Film System TFS200.
Details	From summer 2019: ALD deposition of TiO2, TiN, Ta2O5, Al2O3, ZnO, SiO2, SiN, NiO, ITO, MoO.
Facility	Institute for Compound Semiconductors
School	School of Physics and Astronomy

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