Ewch i’r prif gynnwys

Atomic Layer Deposition (ALD)

Brand/model Beneq, ALD, Thin Film System TFS200.
Manylion From summer 2019: ALD deposition of TiO2, TiN, Ta2O5, Al2O3, ZnO, SiO2, SiN, NiO, ITO, MoO.
Cyfleuster Institute for Compound Semiconductors
Ysgol Yr Ysgol Ffiseg a Seryddiaeth

Cysylltwch

Saleem Shabbir

Email
ics@cardiff.ac.uk

Lleoliad

Queen's Buildings
5 The Parade
Heol Casnewydd
CF24 3AA