Atomic Layer Deposition (ALD)
Brand/model | Beneq, ALD, Thin Film System TFS200. |
---|---|
Manylion | From summer 2019: ALD deposition of TiO2, TiN, Ta2O5, Al2O3, ZnO, SiO2, SiN, NiO, ITO, MoO. |
Cyfleuster | Institute for Compound Semiconductors |
Ysgol | Yr Ysgol Ffiseg a Seryddiaeth |
Cysylltwch
Saleem Shabbir
Lleoliad
Queen's Buildings
5 The Parade
Heol Casnewydd
CF24 3AA
5 The Parade
Heol Casnewydd
CF24 3AA