Fabrication of magnetic materials

Amorphous wires fabrication facilities

In rotating water quenched wires fabrication unit

This is used for the preparation of metallic amorphous and nanocrystalline wires of compositions based on transition metals (Fe, Co, Ni) and metalloids (P, B, C) having a circular cross section of around 125 mm and about 100 m in length in a single-step process by ejecting a molten metal in a moving water layer.

Glass coated wires preparation unit

This is used for the preparation of metallic amorphous and nanocrystalline glass covered wires based on transition metals — metalloid in a single-step process by drawing a softened glass capillary in which the metal is entrapped. Wires with typically 1 — 50 mm diameter of the metal and 3-15 mm thickness of the glass cover can be obtained using this technique.

 

Nanowire Arrays Fabrication Facilities

Magnetic nanowires, both crystalline and amorphous, are prepared through electrochemical deposition in porous membranes such as anodised aluminium oxide or track-etched polymer membranes with nanosized pores.

The Film Production 

The thin film deposition system comprises a TORUS® source, which is both RF- and DC-compatible, and can deposit many classes of materials including conductors, semiconductors, insulators, and refractory materials. It is also capable of reactivesputtering. It is fully computer controlled and can achieve vacuum in the production chamber of 5 ´ 10-8 mbar. The unit has RF and DC- flexible magnetron sputtering sources, substrate semi-automatic front loading, rotatable substrate platten for 3" diameter substrate with motor and controller, 2" target conversion kit for a 3" source (useful to deposit both 2" and 3" targets), substrate cooling (water and liquid nitrogen), film thickness monitor, and plasma cleaning/milling for substrates.